| 000 | 00689nam a2200229Ia 4500 | ||
|---|---|---|---|
| 001 | 90241 | ||
| 003 | BIBL | ||
| 005 | 20160527204635.0 | ||
| 008 | 820720s1983 nyua 00110 eng | ||
| 010 | _a 82013748 | ||
| 020 | _z0126747806 | ||
| 049 | _aEVLG | ||
| 092 |
_a621.55 _bS932v |
||
| 100 | 1 | 0 |
_aStuart, R. V. _9281209 _2Local |
| 245 | 1 | 0 |
_aVacuum technology, thin films, and sputtering _ban introduction _cR.V. Stuart. |
| 260 | 0 |
_aNew York _bAcademic Press _c1983. |
|
| 300 |
_aviii, 151 p. _bill. |
||
| 500 | _aIncludes index. | ||
| 650 | 0 |
_aVacuum technology _9286847 _2Local |
|
| 650 | 0 |
_aCathode sputtering (Plating process) _9208575 _2Local |
|
| 650 | 0 |
_aThin films _9179300 _2Local |
|
| 999 |
_c73490 _d73490 |
||